Spin Coater

Our range of products include programmable spin coater, table top spin coating unit, programmable spin coating system, laboratory spin coater, spin coater machine and spin coating unit.

Programmable Spin Coater

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Product Brochure
Speed max rpm9500 rpm
Speed Range5000 - 10000 RPM
Substrate size6 inch
Vacuum chuckYes
Diameter150 mm
Step count64 steps
Control typeDigital
Speed accuracy±5 rpm
Chamber typeClosed
Power supply230V 50Hz
Country of OriginMade in India
Model NumberHSC-9999
ScreenDigital
Speed9500 RPM
Maximum Power190W
Current Range1.0 Amp
Voltage230V +- 10%
PhaseSingle
Frequency50 Hz
BrandHarrier

Minimum order quantity: 1 Piece

Features:
  • Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.
  • 500 – 9500 RPM 
  • Accuracy<±0.5% of Full Speed
  • Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 16 step 
  • Real time display of RPM, time and program stamps
  • Nonvolatile program memory
  • Input & control through soft touch key pad.
  • Vacuum release switch
  • Substarte size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch(for glass substrate) & 20.0 sq. inch (for silicon wafers)

Table Top Spin Coating Unit

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Product Brochure
Speed max rpm8000 rpm
Substrate size6 inch
Vacuum chuckYes
Country of OriginMade in India
Model Name/NumberHE-SC-8000P
BrandHarrier Enterprises
Accuracy+-0.5%
Vacuum Range- 760 mmhg

Minimum order quantity: 01 Piece

Anti-corrosion spin coater adopts PP chamber (Optional PTFE chamber), which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents.


Anti-corrosion spin coater adopts an advanced precision motor, the maximum speed can reach 6000 RPM / 8000 RPM/ 9999 RPM, which effectively guarantees the uniformity of film formation. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost.

It is very suitable for laboratory purchase.


The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Programmable Spin Coater

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Product Brochure
Speed max rpm8000 rpm
Substrate size6 inch
Vacuum chuckYes
Step count64 steps
Control typeDigital
BrandHarrier Enterprises
Speed accuracy±5 rpm
Automation TypeAutomatic
Country of OriginMade in India
Power Supply230V 10%
Vacuum730 mm Hg 97.33 kPa
Maximum Power190 W
PhaseSingle Phase
Frequency50 Hz

Minimum order quantity: 1 unit

Features:

  • Stainless Steel Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.
  • 500  8000 RPM 
  • Accuracy 0.5% of Full Speed
  • Microprocessor Programmable Speed control with respect to time
  • Preset editable programs of 16 step per program with maximum of 1 program
  • Real time display of RPM, time and program stamps
  • Nonvolatile program memory
  • Input & control through soft touch key pad.
  • Vacuum release switch
  • Substarte size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch (for glass substrate) & 20.0 sq. inch (for silicon wafers)
  • Vacuum chuck: derlin made circular substrate holders of Dia 0.5,1,1.5,2.0 inch 
  • Microprocessor control A C brush less motor
  • Acceleration 2000 rpm/sec (Maximum) use settable
  • Calibration option. 
  • Vacuum Dial gauge.
  • Frame: Epoxy coated MS and Aluminium.
  • Facility for interlocking with Vacuum Pump.
  • Tubing for Vacuum.
  • Gas Purging Attachment for Nitrogen. 
  • Spill drainage facility 

Programmable Spin Coating System

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Product Brochure
Speed max rpm8000 rpm
Substrate size6 inch
Vacuum chuckYes
Step count64
Speed accuracy±5 rpm
Country of OriginMade in India
Spin Range500 - 8000 RPM
Vacuum Range-760 mmHg
BrandHarrier Enterprises
ModelHE-SCU-8000

Minimum order quantity: 1 Piece

 

·             Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.

·             500 – 8000 RPM 

·             Accuracy<±0.5% of Full Speed

·             Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 64 step 

·             Real time display of RPM, time and program stamps

·             Nonvolatile program memory

·             Input & control through soft touch key pad.

·             Vacuum release switch

·             Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch   

        (for glass substrate) & 20.0 sq. inch (for silicon wafers)

·             Vacuum chuck: derlin made circular substrate holders of Dia 0.5”,1”,1.5”,2.0” inch 

·             Microprocessor control A C brush less motor

·             Acceleration 2000 rpm/sec (Maximum) use settable

·             Calibration option. 

·             Vacuum Dial gauge.

·             Frame: Epoxy coated MS.

·             Facility for interlocking with Vacuum Pump.

·       Tubing for Vacuum.

·       Gas Purging Attachment for Nitrogen. 

·       Spill drainage facility 

·       To operate on 230V ± 10%, 1 phase 50 Hz AC only.

·       Maximum Power 190W, Current 1.0 Amp.

Laboratory Spin Coater

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Product Brochure
Speed max rpm9999 rpm
Substrate size6 inch
Vacuum chuckYes
Country of OriginMade in India
ModelLab Type
RPM Range500 - 9999
Vacuum Range-760 mmHg
Controller1 Prog x 64 Segments

·             Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.

·             500 – 9999 RPM 

·             Accuracy<±0.5% of Full Speed

·             Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 64 step 

·             Real time display of RPM, time and program stamps

·             Nonvolatile program memory

·             Input & control through soft touch key pad.

·             Vacuum release switch

·             Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch   

        (for glass substrate) & 20.0 sq. inch (for silicon wafers)

·             Vacuum chuck: derlin made circular substrate holders of Dia 0.5”,1”,1.5”,2.0” inch 

·             Microprocessor control A C brush less motor

·             Acceleration 2000 rpm/sec (Maximum) use settable

·             Calibration option. 

·             Vacuum Dial gauge.

·             Frame: Epoxy coated MS.

·             Facility for interlocking with Vacuum Pump.

·       Tubing for Vacuum.

·       Gas Purging Attachment for Nitrogen. 

·       Spill drainage facility 

·       To operate on 230V ± 10%, 1 phase 50 Hz AC only.

·       Maximum Power 190W, Current 1.0 Amp.

Spin Coater Machine

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Product Brochure
Country of OriginMade in India
Vacuum Range-760 mmHg
Spin Range500-9999
Working Chamber Size6" Inch
Working ChamberPolypropylene

Minimum order quantity: 1 Piece

·             Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.

·             500 – 9999 RPM 

·             Accuracy<±0.5% of Full Speed

·             Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 64 step 

·             Real time display of RPM, time and program stamps

·             Nonvolatile program memory

·             Input & control through soft touch key pad.

·             Vacuum release switch

·             Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch   

        (for glass substrate) & 20.0 sq. inch (for silicon wafers)

·             Vacuum chuck: derlin made circular substrate holders of Dia 0.5”,1”,1.5”,2.0” inch 

·             Microprocessor control A C brush less motor

·             Acceleration 2000 rpm/sec (Maximum) use settable

·             Calibration option. 

·             Vacuum Dial gauge.

·             Frame: Epoxy coated MS.

·             Facility for interlocking with Vacuum Pump.

·       Tubing for Vacuum.

·       Gas Purging Attachment for Nitrogen. 

·       Spill drainage facility 

·       To operate on 230V ± 10%, 1 phase 50 Hz AC only.

·       Maximum Power 190W, Current 1.0 Amp.

Spin Coating Unit

Request Callback

Get Latest Price

Product Brochure
Speed max rpm8000 rpm
Substrate size6 inch
Vacuum chuckYes
Country of OriginMade in India
Model Name/NumberHE-SC-9999P
BrandHarrier Enterprises
Accuracy+-0.5%
Vacuum range-760 mmhg

Minimum order quantity: 01 Piece

Anti-corrosion spin coater adopts PP chamber (Optional PTFE chamber), which is beautiful and sturdy in appearance, has excellent chemical stability and strong corrosion resistance, and can be used in various occasions requiring acid and alkali resistance and organic solvents.

Anti-corrosion spin coater adopts an advanced precision motor, the maximum speed can reach 6000 RPM / 8000 RPM/ 9999 RPM, which effectively guarantees the uniformity of film formation. In addition, the instrument adopts touch screen control and can preset the coating curve, which greatly simplifies the use process and reduces the learning cost.

It is very suitable for laboratory purchase.

The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.


Spin Coater With Vacuum Pump

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Product Brochure
Country of OriginMade in India
BrandHarrier Enterprises
Vacuum Range-760 mmHg
Accelaration2000 rpm/sec
Accuracy<+-0.5% of Full Speed
Power220 V

Minimum order quantity: 1 Piece

 

·             Polypropylene Working Chamber (removable), size 6-inch dia, with transparent photo resist lid with interlock safety switch.

·             500 – 9999 RPM 

·             Accuracy<±0.5% of Full Speed

·             Microprocessor Programmable Speed control with respect to time Preset editable programs of 1 program X 64 step 

·             Real time display of RPM, time and program stamps

·             Nonvolatile program memory

·             Input & control through soft touch key pad.

·             Vacuum release switch

·             Substrate size from 0. 04sq.inch (28 sq.mm) to 4.0 sq. inch   

        (for glass substrate) & 20.0 sq. inch (for silicon wafers)

·             Vacuum chuck: derlin made circular substrate holders of Dia 0.5”,1”,1.5”,2.0” inch 

·             Microprocessor control A C brush less motor

·             Acceleration 2000 rpm/sec (Maximum) use settable

·             Calibration option. 

·             Vacuum Dial gauge.

·             Frame: Epoxy coated MS.

·             Facility for interlocking with Vacuum Pump.

·       Tubing for Vacuum.

·       Gas Purging Attachment for Nitrogen. 

·       Spill drainage facility 

·       To operate on 230V ± 10%, 1 phase 50 Hz AC only.

·       Maximum Power 190W, Current 1.0 Amp.

X

Contact Us

Prince (Manager)
Harrier Enterprises
First Floor ,Block-1, H.No-210, SDV Lakkarpur,Poll Factory
Surajkund Faridabad, Faridabad - 121009, Haryana, India

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